Exposure mask

Details Exposure mask Exposure mask

1995-03-13

1996-10-08

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430394, G03F 900

Patent

active

055630103

ABSTRACT:
There is disclosed an exposure mask useful for a lithography process for semiconductor device. The exposure mask consists of a plurality of spaced apart light screen patterns and a plurality of spaced apart subsidiary patterns on a transparent substrate, each of the subsidiary patterns being positioned between the light screen patterns and at an area where a necking effect is expected upon a forming photosensitive film pattern over a deteriorated topology using a light exposure mask.

REFERENCES:
patent: 5424154 (1995-06-01), Borodovsky

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