Exposure head

Details Exposure head Exposure head

2005-08-09

2005-08-09

Ullah, Akm Enayet (Department: 2874)

Optical waveguides

Directional optical modulation within an optical waveguide

C385S040000, C359S197100, C359S204200

Reexamination Certificate

active

06928198

ABSTRACT:
The present invention provides, in order to obtain a desired focal depth t in a range α of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a digital micromirror device (DMD) is placed satisfies the following formula:DW≤α×M2×t-K×λaθ.

REFERENCES:
patent: 6034378 (2000-03-01), Shiraishi
patent: 6535271 (2003-03-01), Ogasawara
patent: 6542178 (2003-04-01), Miyagawa et al.
patent: 6717106 (2004-04-01), Nagano et al.
patent: 6768505 (2004-07-01), Zelenka
patent: 6832045 (2004-12-01), Nakaya et al.

Affiliated with

Also associated with

Rating

Exposure head does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure head, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure head will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3520521