Exposure for performing synchronized off-axis alignment

Details Exposure for performing synchronized off-axis alignment Exposure for performing synchronized off-axis alignment

1998-11-16

2000-12-26

Allen, Stephone B.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

355 53, 356401, G01N 2186

Patent

active

061663921

ABSTRACT:
An exposure has at least two wafer pads for holding wafers at the same time to perform different tasks including exposing a wafer, aligning a wafer, and loading or unloading a wafer synchronously. The exposure of the invention includes an exposing unit, a wafer supporting unit and a alignment beam scan unit. The wafer-supporting unit contains at least two wafer pads for holding wafers. The alignment beam scan unit contains an interferometer for detecting the interference patterns formed by the alignment beams and the alignment marks on the wafers. The tasks of aligning a wafer, and exposing a wafer, or loading/unloading a wafer can be performed on the wafers placed on each individual wafer pad synchronously.

REFERENCES:
patent: 4653903 (1987-03-01), Torigoe et al.
patent: 4878086 (1989-10-01), Isohata et al.
patent: 5227839 (1993-07-01), Allen
patent: 5923403 (1999-07-01), Jain
patent: 5959271 (1999-09-01), Nishi
patent: 5999270 (1999-12-01), Mori et al.

Affiliated with

Also associated with

Rating

Exposure for performing synchronized off-axis alignment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure for performing synchronized off-axis alignment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure for performing synchronized off-axis alignment will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-997698