Exposure equipment and related control method

Details Exposure equipment and related control method Exposure equipment and related control method

2005-08-30

2008-03-04

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S077000, C356S394000

Reexamination Certificate

active

07339651

ABSTRACT:
Exposure equipment adapted for use in the manufacture of semiconductor devices and a related control are disclosed. A wafer stage in the exposure equipment comprises an image sensor adapted to detect patterned light from the reticle. Image data corresponding to the detected patterned light is compared to reference image data to verify a state of overlay mismatch of reticle pattern accuracy prior to wafer exposure.

REFERENCES:
patent: 5677091 (1997-10-01), Barr et al.
patent: 6064484 (2000-05-01), Kobayashi et al.
patent: 6486939 (2002-11-01), Lin
patent: 09-304032 (1997-11-01), None
patent: 1998-026695 (1998-07-01), None
patent: 1020020057539 (2002-07-01), None

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