Exposure equipment and control method of the same

Details Exposure equipment and control method of the same Exposure equipment and control method of the same

2007-04-03

2007-04-03

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

11117434

ABSTRACT:
A controller controls a wafer carrier to move from a SMIF-POD to transfer and collect a wafer between a space of a transfer unit through a thermal chamber. The wafer carrier is returned into the SMIF-POD, when the wafer is exposed, to be kept waiting in the SMIF-POD until the wafer completes the exposure. The wafer can be shielded from direct airflow by a protection plate inside the transfer area.

REFERENCES:
patent: 6960257 (2005-11-01), Thompson et al.
patent: 2004/0187542 (2004-09-01), Edo
patent: 2005/0063799 (2005-03-01), Larson et al.
Patent Abstracts of Japan, Publication No. 07176458, published on Jul. 14, 1995.

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