Exposure dose control of rotating electron beam recorder

Details Exposure dose control of rotating electron beam recorder Exposure dose control of rotating electron beam recorder

2007-05-15

2007-05-15

Sniezek, Andrew L. (Department: 2627)

Dynamic magnetic information storage or retrieval

Automatic control of a recorder mechanism

Controlling the head

C369S126000, C430S296000

Reexamination Certificate

active

10449727

ABSTRACT:
In a beam lithography operation the relative motion between a work piece and the exposure beam produces variations in linear speed at different regions of the work piece surface. For example, if a disk work piece rotates with a constant angular velocity (CAV) relative to the beam, the linear surface speed relative to the beam impact point increases in proportion to increasing radial distance of that point from the center of the disk. To provide uniform exposure dose, the duty cycle of pulses of the exposure beam are varied in accord with radial distance.

REFERENCES:
patent: 5130970 (1992-07-01), Ohta
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patent: 5279775 (1994-01-01), Thomas et al.
patent: 6850377 (2005-02-01), Hashi et al.
patent: 2002/0034152 (2002-03-01), Kumasaka et al.
patent: 2004/0001415 (2004-01-01), Formato et al.

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