Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – In combination with or also constituting light responsive...
Reexamination Certificate
2008-07-29
2008-07-29
Louie, Wai-Sing (Department: 2814)
Active solid-state devices (e.g., transistors, solid-state diode
Incoherent light emitter structure
In combination with or also constituting light responsive...
C257S088000, C257S098000, C257S257000, C257SE33002
Reexamination Certificate
active
07405432
ABSTRACT:
The present invention provides a highly controllable device for exposure from the back side and an exposure method, and also provides a method of manufacturing a semiconductor device using the same. The present invention involves exposure with the use of the back side exposure device of which a reflecting means is disposed on the front side of a substrate, apart from a photosensitive thin film surface by a distance X (X=0.1 μm to 1000 μm), and formation of a photosensitive thin film pattern in a self alignment manner, with good controllability, at a position a distance Y away from the end of a pattern. The invention fabricates a TFT using that method.
REFERENCES:
patent: 4269886 (1981-05-01), Bondoc
patent: 4357557 (1982-11-01), Inohara et al.
patent: 5072263 (1991-12-01), Watanabe et al.
patent: 5107175 (1992-04-01), Hirano et al.
patent: 5124204 (1992-06-01), Yamashita et al.
patent: 5189405 (1993-02-01), Yamashita et al.
patent: 5247190 (1993-09-01), Friend et al.
patent: 5399502 (1995-03-01), Friend et al.
patent: 5518940 (1996-05-01), Hodate et al.
patent: 5530265 (1996-06-01), Takemura
patent: 5643826 (1997-07-01), Ohtani et al.
patent: 5686360 (1997-11-01), Harvey, III et al.
patent: 5693956 (1997-12-01), Shi et al.
patent: 5696011 (1997-12-01), Yamazaki et al.
patent: 5706064 (1998-01-01), Fukunaga et al.
patent: 5757126 (1998-05-01), Harvey, III et al.
patent: 5771562 (1998-06-01), Harvey, III et al.
patent: 5811177 (1998-09-01), Shi et al.
patent: 5882761 (1999-03-01), Kawami et al.
patent: 5920082 (1999-07-01), Kitazawa et al.
patent: 5923962 (1999-07-01), Ohtani et al.
patent: 5952778 (1999-09-01), Haskal et al.
patent: 5962962 (1999-10-01), Fujita et al.
patent: 5973258 (1999-10-01), Shiotsuka et al.
patent: 5990542 (1999-11-01), Yamazaki
patent: 6084647 (2000-07-01), Hatano et al.
patent: 6114183 (2000-09-01), Hamada et al.
patent: 6146225 (2000-11-01), Sheats et al.
patent: 6147451 (2000-11-01), Shibata et al.
patent: 6149757 (2000-11-01), Chikaki et al.
patent: 6150187 (2000-11-01), Zyung et al.
patent: 6198217 (2001-03-01), Suzuki et al.
patent: 6198220 (2001-03-01), Jones et al.
patent: 6239470 (2001-05-01), Yamazaki
patent: 6252248 (2001-06-01), Sano et al.
patent: 6268071 (2001-07-01), Yasukawa et al.
patent: 6268695 (2001-07-01), Affinito
patent: 6274887 (2001-08-01), Yamazaki et al.
patent: 6320115 (2001-11-01), Kataoka et al.
patent: 6323416 (2001-11-01), Komori et al.
patent: 6362027 (2002-03-01), Yamazaki et al.
patent: 6441468 (2002-08-01), Yamazaki
patent: 6447867 (2002-09-01), Kominami et al.
patent: 6784037 (2004-08-01), Yamazaki et al.
patent: 0 999 595 (2000-05-01), None
patent: 07-130652 (1995-05-01), None
patent: 08-068990 (1996-03-01), None
patent: 08-096959 (1996-04-01), None
patent: 09-312260 (1997-12-01), None
patent: 10-092576 (1998-04-01), None
patent: WO 90/13148 (1990-11-01), None
Schenk, H. et al, “Polymers for Light Emitting Diodes,” Eurodisplay '99, Proceedings of the 19th International Display Research Conference, Sep. 6-9, 1999, Berlin, Germany, pp. 33-37, (1999).
“Investigation Committee of a Solar Cell,” ed.,Solar Cell Handbook,Institute of Electrical Engineers of Japan, pp. 164-167 (1985), with concise statement in English.
Cook Alex McFarron Manzo Cummings & Mehler, Ltd.
Louie Wai-Sing
Semiconductor Energy Laboratory Co,. Ltd.
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