Exposure device and exposure method

Details Exposure device and exposure method Exposure device and exposure method

2006-11-14

2006-11-14

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S055000

Reexamination Certificate

active

07136146

ABSTRACT:
An exposure device that sequentially projects and repeatedly transfers a predetermined pattern formed on a reticule onto wafers via an optical projection system, the exposure device including a movement unit that positions a current shot region on a wafer in the focal position of the optical projection system, a detection unit that detects tilting on an exposure surface of the current shot region with respect to an image plane of the optical projection system, and a plurality of first piezoelectric elements that correct the tilting on the current shot region with respect to the optical axis, based upon the detection results of the detection unit, so that the exposure surface of the current shot region will substantially match the image plane.

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patent: A-H07-74088 (1995-03-01), None
patent: A-H10-209030 (1998-08-01), None

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