Photography – Line generation
Reexamination Certificate
2006-05-23
2006-05-23
Mahoney, Christopher (Department: 2851)
Photography
Line generation
C355S053000, C382S151000
Reexamination Certificate
active
07050716
ABSTRACT:
In order to provide an exposure device by which aligning of an exposure pattern is realized when manufacturing a build up wiring board or the like, an exposure device which exposes a photosensitive material with a light beam modulated in accordance with image information comprising a reading section which reads a radioscopic image of a specific pattern provided on an inner layer of a laminated structure, and an aligning section which aligns an exposure position of the photosensitive material laminated on a surface of an outer layer of the laminated structure on the basis of the position information of the read radioscopic image of the specific pattern, is provided.
REFERENCES:
patent: 5590170 (1996-12-01), Zweig
patent: 6552352 (2003-04-01), Momose et al.
patent: 6832045 (2004-12-01), Nakaya et al.
patent: 2001/0026638 (2001-10-01), Sangu et al.
patent: 2000-275863 (2000-10-01), None
Fujii Takeshi
Kudoh Yoshimitsu
Nakaya Daisuke
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