Exposure data preparing apparatus, exposure data preparing metho

Details Exposure data preparing apparatus, exposure data preparing metho Exposure data preparing apparatus, exposure data preparing metho

1996-03-19

1999-09-21

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

H01J 37302

Patent

active

059557389

ABSTRACT:
An exposure data preparing apparatus includes a field placement editor for placing exposure patterns that correspond to design data. Placement is done for each sub-field obtained by dividing a field on an LSI to be designed, and each sub-field has a size that can be covered by deflection of a beam from an exposure apparatus. A map preparing editor prepares a plurality of maps that can be covered by a single shot of the charged particle beam, by dividing the sub-field in which the exposure pattern is placed. A CPU determines a beam dosage of the charged particle beam derived from a density of the exposure pattern in the map.

REFERENCES:
patent: 4500789 (1985-02-01), Ban et al.
patent: 5149975 (1992-09-01), Yoda et al.
patent: 5278419 (1994-01-01), Takahashi et al.

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