Exposure data correction method, exposing method, photomask, sem

Details Exposure data correction method, exposing method, photomask, sem Exposure data correction method, exposing method, photomask, sem

1997-11-17

2000-11-07

Couso, Jose L.

Image analysis

Applications

Manufacturing or product inspection

G06K 900

Patent

active

061447609

ABSTRACT:
An initial hash database is generated by giving hash indices to drawing data of drawing patterns that are obtained by performing calculation processing on exposure data relating to layout-designed exposure data. Then, drawing data of a target drawing pattern is extracted by searching the hash database, and the extracted drawing data is subjected to a proximity effect correction. Then, a new hash database is generated by giving hash indices to the corrected drawing data. As a result, the data retrieval time is greatly shortened and the amount of corrected data is reduced.

REFERENCES:
patent: 5051598 (1991-09-01), Ashton et al.
patent: 5305225 (1994-04-01), Yamaguchi et al.
patent: 5377340 (1994-12-01), Seroussi et al.
patent: 5553273 (1996-09-01), Liebmann
patent: 5754443 (1998-05-01), Manabe
European Search Report dated Nov. 4, 1999.

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