Exposure controlling photomask and production method therefor

Details Exposure controlling photomask and production method therefor Exposure controlling photomask and production method therefor

2006-05-30

2006-05-30

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S296000, C430S314000, C430S320000, C430S321000, C430S942000

Reexamination Certificate

active

07052806

ABSTRACT:
The present invention relates to an exposure controlling photomask used to form a three-dimensional face structure in a resist pattern and having a light interrupting film able to be continuously controlled in transmitted light amount from 100% to 0%, and a production method thereof. A light interrupting film2is deposited on a substrate3, and a photosensitive material6is coated on this light interrupting film2. Next, irradiation is performed by changing the irradiating amount of an electron beam every place of the photosensitive material6using an electron beam exposure technique. Next, development is performed and the photosensitive material is formed in the three-dimensional face structure. Next, in an etching process, the three-dimensional face structure is transferred to the light interrupting film2by etching-back the photosensitive material6and the light interrupting film2as a foundation.

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