Exposure control system for ophthalmic photographing apparatus

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G03B 2900

Patent

active

045912491

ABSTRACT:
Exposure control system for ophthalmic photographing apparatus including a focusing mark projecting optical system for projecting focusing mark on a patient's eye so that the focusing condition can be clearly recognized. A detector is provided for detecting the intensity of the light from the mark image. The signal from the detector is used to control the exposure control system by for example determining the time in which the photographing light source is energized.

REFERENCES:
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patent: 4253744 (1981-03-01), Sawa
patent: 4400070 (1983-08-01), Isono et al.
patent: 4412728 (1983-11-01), Sakane et al.
patent: 4429970 (1984-02-01), Fujiwara
patent: 4436388 (1984-03-01), Takahashi et al.
patent: 4452517 (1984-06-01), Kohayakawa
patent: 4469416 (1984-09-01), Isono

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