Exposure control system for full field photolithography using pu

Details Exposure control system for full field photolithography using pu Exposure control system for full field photolithography using pu

1988-02-19

1989-02-14

Miller, Jr., George H.

Recorders

Printing, dotting, or punching marker

Ink transfer support or moving means

346 76L, G01D 942, G01D 1510

Patent

active

048049786

ABSTRACT:
A photolithography exposure control system tolerant of noisy pulsed light sources having a controllable variable attenuator. A detector monitors the exposure dose of a light pulse enabling a controller to trigger another light pulse, when a predetermined attenuator is positioned in its path. A high degree of exposure control is achieved with a minimum number of light pulses or shots.

REFERENCES:
patent: 4264986 (1981-04-01), Willis
patent: 4613877 (1986-09-01), Spencer et al.
patent: 4698692 (1987-10-01), Fry et al.
patent: 4719474 (1988-01-01), Hansen et al.
patent: 4754291 (1988-06-01), Horikawa

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