Exposure control system employing blade sensing follow focus arr

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354 34, 354 42, 354 44, 354230, G03B 714

Patent

active

039507661

ABSTRACT:
An exposure control system for photographic apparatus utilizing pulse driven shutter-diaphragm light regulating elements in conjunction with a follow focus mechanism which in response to the location of the light regulating elements terminates the driving operation thereby automatically selecting an aperture value for flash operation. The follow focus mechanism locates a sensor switch in the path of travel of a pair of aperture defining blades as a function of scene ranging such that the sensor switch is actuated by the blades as the latter are displaced to the selected switch location and, in turn, terminates further pulses to the stepper motor thereby stopping the blades at a predetermined location defining a selected aperture value.

REFERENCES:
patent: 3611895 (1971-10-01), Albedyll et al.
patent: 3638545 (1972-02-01), Kobayashi et al.
patent: 3668994 (1972-06-01), Fujii
patent: 3695158 (1972-10-01), Fahlenberg
patent: 3738240 (1973-06-01), Mitani et al.
patent: 3750543 (1973-08-01), Eloranta et al.
patent: 3772974 (1973-11-01), Shimomura
patent: 3832722 (1974-08-01), Douglas

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