Exposure control system

Details Exposure control system Exposure control system

1983-09-19

1985-04-23

Hix, L. T.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 69, 355 71, G03B 2774

Patent

active

045126577

ABSTRACT:
In the printing of an IC circuit pattern on a wafer or photo mask, a system performs an exposure control by measuring the amount of light passed through a shutter and controlling the opening and closing operations of the shutter. The system includes means whereby a superposed measurement of an exposure light quantity during the opening operation of the shutter or the time interval between the time that the opening is started and the time that the opening is completed is effected by preliminarily raising the quantity by an amount corresponding to an excessive exposure light quantity during the shutting operation of the shutter or the time interval between the time that the shutting is started and the time that the shutting is completed, thereby controlling the shutter up to the maximum speed determined by the characteristics of a mechanism itself including the driving system of the shutter.

REFERENCES:
patent: 4034383 (1977-07-01), Mashimo et al.

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