Exposure control method for adjusting the temperature of a workp

Details Exposure control method for adjusting the temperature of a workp Exposure control method for adjusting the temperature of a workp

1991-01-29

1992-07-28

Hix, L. T.

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

355 53, 355 77, G03B 2752

Patent

active

051344360

ABSTRACT:
Disclosed is a method of exposure control for use in a step-and-repeat type exposure apparatus that includes a radiation source for emitting a radiation beam and a workpiece holding chuck having an attracting surface. The method includes placing a first workpiece on the attracting surface of the holding chuck so that the workpiece is attracted to and held by the holding chuck, moving the holding chuck stepwise so that different portions of the workpiece are sequentially brought to an exposure station and exposing that portion of the first workpiece placed at the exposure position, detecting the temperature of the attracting surface of the holding chuck each time a portion of the first workpiece is exposed, memorizing data related to the detected temperature, removing the first workpiece from the holding chuck and placing a second workpiece on the attracting surface of the holding chuck, moving the holding chuck, bearing the second workpiece, stepwise for exposure of different portions of the second workpiece and adjusting the temperature of the attracting surface of the holding chuck each time a portion of the second workpiece is brought to the exposure position, in accordance with the memorized data.

REFERENCES:
patent: 4503335 (1985-03-01), Takahashi
Patent Abstracts of Japan, vol. 6, No. 234, Nov. 20, 1982, Kokai No. 57-136,325.
Patent Abstracts of Japan, vol. 8, No. 53, Mar. 9, 1984, Kokai No. 58-207,634.

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