Exposure assemblies, printing systems and related methods

Details Exposure assemblies, printing systems and related methods Exposure assemblies, printing systems and related methods

2006-05-09

2006-05-09

Pham, Hai (Department: 2861)

Incremental printing of symbolic information

Light or beam marking apparatus or processes

Scan of light

C347S258000

Reexamination Certificate

active

07042485

ABSTRACT:
Systems, methods, and assemblies are provided for focusing light on a photoconductor. In one embodiment, an exposure assembly is provided. The exposure assembly includes an array of light-focusing structures. The light-focusing structures include a plurality of lenses. The individual lenses include a material that is deformable sufficient to focus light upon a photoconductor.

REFERENCES:
patent: 4872743 (1989-10-01), Baba et al.
patent: 5124835 (1992-06-01), Shibaguchi et al.
patent: 5135897 (1992-08-01), Uchino et al.
patent: 5177475 (1993-01-01), Stephany et al.
patent: 5212583 (1993-05-01), Vali et al.
patent: 5877886 (1999-03-01), Ishii et al.
patent: 6340986 (2002-01-01), Morrison et al.

Affiliated with

Also associated with

Rating

Exposure assemblies, printing systems and related methods does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure assemblies, printing systems and related methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure assemblies, printing systems and related methods will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3597461