Exposure apparatus with light shielding portion for plotosensiti

Photocopying – Projection printing and copying cameras – Illumination systems or details

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250548, 355 53, 355 71, 355 77, 378 34, H01L 21027, G03B 2772

Patent

active

057608814

ABSTRACT:
An exposure apparatus, having an illumination optical system for radiating a light beam from a light source to a pattern area of a mask for transferring the image of the pattern area onto a photosensitive substrate by the light beam passing through the mask, is provided with plural sets of a first reference mark and a second reference mark arranged on the mask and the photosensitive substrate at positions corresponding to each other, and a light-shielding device for shielding the light beams radiated toward the second reference marks, whereby it is possible to re-use the second reference marks in a post-process by preventing the first reference marks on the mask from being superposed on the second reference marks on the photosensitive substrate or from being transferred onto a part near the second reference marks.

REFERENCES:
patent: 4613981 (1986-09-01), Siddall et al.
patent: 5150391 (1992-09-01), Ebinuma et al.
patent: 5161176 (1992-11-01), Ebinuma et al.
patent: 5317615 (1994-05-01), Ebinuma et al.
patent: 5473410 (1995-12-01), Nishi
patent: 5506684 (1996-04-01), Ota et al.

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