Exposure apparatus with laser source requiring new gas introduct

Details Exposure apparatus with laser source requiring new gas introduct Exposure apparatus with laser source requiring new gas introduct

1994-03-14

1995-01-17

Scott, Jr., Leon

Coherent light generators

Particular active media

Gas

372 33, 372 29, H01S 322

Patent

active

053832175

ABSTRACT:
An exposure apparatus, such as a stepper, uses a laser light source requiring new gas introduction from time to time. The timing of new gas addition and partial gas replacement is controlled so that the exposure apparatus is not adversely affected. In one embodiment, the timing is such that gas introduction or replacement occurs during interruption of exposure operation, which does not start again until the fluctuation of the output of laser light caused by gas introduction or replacement is stabilized.

REFERENCES:
patent: 3806829 (1974-04-01), Duston et al.
patent: 4429392 (1984-01-01), Yoshida et al.
patent: 4630373 (1986-12-01), Inoue et al.
patent: 4916707 (1990-04-01), Rosenkranz
patent: 4935937 (1990-06-01), Yamazaki et al.
patent: 4937837 (1990-06-01), Iehisa
patent: 4956846 (1990-09-01), Iehisa
patent: 5109388 (1992-04-01), Rudko

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