Exposure apparatus with interferometer

Details Exposure apparatus with interferometer Exposure apparatus with interferometer

2007-06-26

2007-06-26

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S520000

Reexamination Certificate

active

11335473

ABSTRACT:
A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source and passing through the illumination system, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object for exposure of the same with the pattern, and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.

REFERENCES:
patent: 5142132 (1992-08-01), MacDonald et al.
patent: 5381210 (1995-01-01), Hagiwara
patent: 5420436 (1995-05-01), Seya et al.
patent: 5801815 (1998-09-01), Takahashi
patent: 5805273 (1998-09-01), Unno
patent: 5828455 (1998-10-01), Smith et al.
patent: 5898501 (1999-04-01), Suzuki et al.
patent: 6088379 (2000-07-01), Owa et al.
patent: 6115175 (2000-09-01), Maruyama et al.
patent: 6278514 (2001-08-01), Ohsaki
patent: 6281966 (2001-08-01), Kenmoku
patent: 6614535 (2003-09-01), Kakuchi et al.
patent: 6633362 (2003-10-01), Murakami et al.
patent: 6774982 (2004-08-01), Ouchi
patent: 7023561 (2006-04-01), Kakuchi et al.
patent: 5-315225 (1993-11-01), None
patent: 05-315225 (1993-11-01), None
patent: 08-179202 (1996-07-01), None
patent: 8-179202 (1996-07-01), None
patent: 9-63923 (1997-03-01), None
patent: 09/63923 (1997-07-01), None
patent: 10/341054 (1998-12-01), None
patent: 10-341054 (1998-12-01), None
Japanese Office Action dated Apr. 12, 2005, issued in corresponding Japanese patent application No. 11-079287, with partial English translation.

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