Exposure apparatus with interferometer

Details Exposure apparatus with interferometer Exposure apparatus with interferometer

2006-04-04

2006-04-04

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S515000

Reexamination Certificate

active

07023561

ABSTRACT:
A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object, and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.

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Japanese Office Action dated Apr. 12, 2005, issued in corresponding Japanese patent application No. 11-079287, with partial English translation.

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