Exposure apparatus with foreign particle detector

Details Exposure apparatus with foreign particle detector Exposure apparatus with foreign particle detector

1985-10-23

1987-06-30

LaRoche, Eugene R.

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

356400, G01N 2100

Patent

active

046766375

ABSTRACT:
A plurality of substrate assemblies each including a substrate such as a reticle or photomask used for exposure and frames, mounted to the opposite surfaces of the substrate, to which foreign particle deposition preventive films are applied are stored in a magazine. By using a transport unit, a substrate assembly is taken out of the magazine, transported from the magazine to a mask table disposed at an exposure position and set at the mask table. A foreign particle detector is provided near the transport unit to optically detect foreign particles present on the foreign particle deposition preventive film of the substrate assembly. The substrate assembly set at the mask table is aligned to a wafer. A light beam is irradiated on the substrate assembly aligned relative to the wafer and a circuit pattern formed on the substrate is projected upon the wafer through a projection optical system to expose the wafer to the light beam through the circuit pattern.

REFERENCES:
patent: 4153371 (1979-05-01), Koizumi et al.
patent: 4362389 (1982-12-01), Koizumi et al.

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