Exposure apparatus with a substrate holding mechanism

Details Exposure apparatus with a substrate holding mechanism Exposure apparatus with a substrate holding mechanism

1990-07-11

1992-03-03

Berman, Jack I.

Radiant energy

Supported for nonsignalling objects of irradiation

2504401, 2504411, G21K 508

Patent

active

050935798

ABSTRACT:
A substrate holding device includes a holding table having a reduced pressure passageway; a pressure gauge for measuring a value related to the pressure in the reduced pressure passageway; a pump for producing a pressure difference between a first surface of the substrate to be attracted to the holding table and a second surface of the substrate not to be attracted to the holding table; a valve which can be opened/closed for control of the pressure in the reduced pressure passageway; a pressure control system for controlling the opening/closing of the valve on the basis of an output corresponding to the value measured by the pressure gauge; and a temperature control system for controlling the temperature of the holding table.

REFERENCES:
patent: 4194233 (1980-03-01), Jones et al.
patent: 4383178 (1983-05-01), Shibata et al.
patent: 4498833 (1985-02-01), Hertel
patent: 4503335 (1985-03-01), Takahashi
patent: 4786947 (1988-11-01), Kosugi et al.
patent: 4852133 (1989-07-01), Ikeda et al.
patent: 4888488 (1989-12-01), Miyake
patent: 4900938 (1990-02-01), Suzuki et al.
patent: 4969168 (1990-11-01), Sakamoto et al.

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