Exposure apparatus utilizing surface position detection, method

Details Exposure apparatus utilizing surface position detection, method Exposure apparatus utilizing surface position detection, method

1998-02-06

2000-09-26

Pham, Hoa Q.

Optics: measuring and testing

By polarized light examination

With light attenuation

356400, 355 53, 250548, G01B 1114

Patent

active

061249335

ABSTRACT:
In an exposure apparatus and method utilizing a projection system, a surface state relating to an exposure area of the projection system is determined by illuminating the exposure area with light, receiving light from the exposure area, designating positions of a plurality of detection points in the exposure area in accordance with a size of the exposure area, and detecting, based on information of received light corresponding to the plurality of detection points, positions related to the plurality of detection points.

REFERENCES:
patent: 5218415 (1993-06-01), Kawashima
patent: 5448332 (1995-09-01), Sakakibara et al.
patent: 5801835 (1998-09-01), Mizutani et al.

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