Exposure apparatus using blaze type diffraction grating to...

Details Exposure apparatus using blaze type diffraction grating to... Exposure apparatus using blaze type diffraction grating to...

2005-04-11

2008-10-14

Kim, Peter B (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C356S328000, C359S571000

Reexamination Certificate

active

07436490

ABSTRACT:
This invention generally relates to an exposure apparatus and an exposure method using EUV light. In one preferred form of the present invention, the exposure apparatus is arranged to expose a substrate to a pattern of an original by use of extreme ultraviolet light, and it includes a blaze type diffraction grating disposed so that light from a plasma light source is incident thereon, and an optical system for directing extreme ultraviolet light from the blaze type diffraction grating to at least one of the original and the substrate.

REFERENCES:
patent: 6469827 (2002-10-01), Sweatt et al.
patent: 6825988 (2004-11-01), Bristol
patent: 2002/0097385 (2002-07-01), Van Elp et al.
patent: 2004/0051954 (2004-03-01), Bristol
patent: 2004/0075830 (2004-04-01), Miyake et al.
patent: 1-175736 (1989-07-01), None
A European Search Report dated Nov. 27, 2007 for the corresponding European Patent Application No. 05252272.9-1226.

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