Exposure apparatus, setting method, and exposure method...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Details

C355S067000

Reexamination Certificate

active

07864296

ABSTRACT:
An exposure apparatus for exposing a pattern of a reticle onto a plate using a light from a light source and an optical system includes a measuring part for obtaining polarization information of the light that has passed the optical system, the polarization information including at least one of polarized light intensities, a ratio between the polarized light intensities, a degree of polarization, and a retardation of two orthogonal directions that are both parallel to the optical axis, and a controller for controlling, based on a measurement result by the measuring part, at least one exposure parameter of the light source and the optical system.

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Ebihara, Takeaki, et al. “Characterization of Imaging Performance: Considering Both Illumination Intensity Profile and Lens Aberration,” Proceedings of the SPIE—The International Society for Optical Engineering SPIE-INT., Soc. Opt. Eng. USA, vol. 5754, No. 1, 2004. pp. 1693-1703.
Office Action issued in corresponding Chinese Patent Application No. 200610105988.3 dated Jul. 3, 2009.

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