Exposure apparatus, semiconductor device manufacturing...

Details Exposure apparatus, semiconductor device manufacturing... Exposure apparatus, semiconductor device manufacturing...

2005-08-23

2005-08-23

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Distortion introducing or rectifying

C355S053000, C355S077000, C356S399000

Reexamination Certificate

active

06934004

ABSTRACT:
An exposure apparatus includes a measurement device for measuring a distortion of an image of a reticle formed on a substrate by scanning exposure, a calculation device for calculating a position compensation parameter for each distortion, by separating the measured distortion into a symmetrical component and an asymmetrical component, and a control device for controlling scanning of either the reticle or the substrate based on the position compensation parameter calculated by the calculation device.

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