Exposure apparatus of an optical disk master, method of...

Dynamic information storage or retrieval – Specific detail of information handling portion of system – Radiation beam modification of or by storage medium

Reexamination Certificate

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C369S118000

Reexamination Certificate

active

10187491

ABSTRACT:
An exposure apparatus of an optical disk master having a laser source, a deflector for deflecting a recording laser beam obtained based on the laser beam of the laser source and an objective lens for focusing the recording laser beam on an optical disk master, has a lens system provided between the laser source and the deflector, which has a first lens for focusing the laser beam and a second lens for adjusting the focused laser beam to a desired beam diameter; and a pinhole placed at a practical focal position of the lens system.

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Chinese Office Action for Patent Application No. 021412472, dated Nov. 5, 2004 (with English translation).

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