Exposure apparatus of an optical disk master, method of...

Details Exposure apparatus of an optical disk master, method of... Exposure apparatus of an optical disk master, method of...

2006-05-16

2006-05-16

Wellington, Andrea (Department: 2652)

Dynamic information storage or retrieval

Specific detail of information handling portion of system

Radiation beam modification of or by storage medium

C369S112230

Reexamination Certificate

active

07046613

ABSTRACT:
An exposure apparatus of an optical disk master having a laser source, a deflector for deflecting a recording laser beam obtained based on the laser beam of the laser source and an objective lens for focusing the recording laser beam on an optical disk master, has a lens system provided between the laser source and the deflector, which has a first lens for focusing the laser beam and a second lens for adjusting the focused laser beam to a desired beam diameter; and a pinhole placed at a practical focal position of the lens system.

REFERENCES:
patent: 4209793 (1980-06-01), Ueno
patent: 5570224 (1996-10-01), Endo et al.
patent: 6087669 (2000-07-01), Suzuki
patent: 6256281 (2001-07-01), Tanaka et al.
patent: 05-81708 (1993-04-01), None
patent: 2000-021002 (2000-01-01), None
patent: 2000021002 (2000-01-01), None
Chinese Office Action for Patent Application No. 021412472, dated Nov. 5, 2004 (with English translation).

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