Exposure apparatus mounted with measuring apparatus

Details Exposure apparatus mounted with measuring apparatus Exposure apparatus mounted with measuring apparatus

2005-02-25

2009-11-17

Chowdhury, Tarifur (Department: 2886)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

07619748

ABSTRACT:
An exposure apparatus for exposing a pattern of a mask onto an object using light from a light source, includes a projection optical system for projecting the pattern onto the object, and a measuring apparatus for measuring, as an interference fringe, optical performance of the projection optical system using the light, wherein the measuring apparatus is a point diffraction interferometer that has a pinhole to form an ideal spherical wave, a line diffraction interferometer that has a slit to form an ideal cylindrical wave or an ideal elliptical wave, or a shearing interferometer that utilizes a shearing interferometry.

REFERENCES:
patent: 4624569 (1986-11-01), Kwon
patent: 5270771 (1993-12-01), Sato
patent: 5898501 (1999-04-01), Suzuki et al.
patent: 6266147 (2001-07-01), Naulleau
patent: 6278514 (2001-08-01), Ohsaki
patent: 6307635 (2001-10-01), Goldberg
patent: 6312373 (2001-11-01), Ichihara
patent: 6573997 (2003-06-01), Goldberg et al.
patent: 6614513 (2003-09-01), Hoyer
patent: 6633362 (2003-10-01), Murakami et al.
patent: 6774982 (2004-08-01), Ouchi
patent: 6914665 (2005-07-01), Ishikawa
patent: 6937345 (2005-08-01), Kuramoto
patent: 7095510 (2006-08-01), Fukui
patent: 2002/1004138 (2002-04-01), Kwan
patent: 2002/0145717 (2002-10-01), Baselmans et al.
patent: 2002/0159048 (2002-10-01), Inoue et al.
patent: 2002/0163648 (2002-11-01), Degertekin et al.
patent: 2004/0090606 (2004-05-01), Ishikawa
patent: 2006/0250607 (2006-11-01), Takahashi
patent: 1 387 220 (2004-04-01), None
patent: 1 536 289 (2005-01-01), None
patent: 57-064139 (1982-04-01), None
patent: 2000-097666 (2000-04-01), None
patent: 2000-146705 (2000-05-01), None
patent: 2002-022608 (2002-01-01), None
patent: 10-2004-0007444 (2004-01-01), None
patent: 03/087945 (2003-10-01), None
Communication pursuant to Article 96(2) EPC, dated Mar. 29, 2006.
Medecki, H. et al: “Phase-Shifting Point Diffraction Interferometer”, Optics Letters, Optical Society of America, Washington, US, vol. 21, No. 29, Oct. 1996, pp. 1526-1528.
Communication from European Patent Office, dated Jun. 29, 2005 forwarding European Search Report dated Jun. 21, 2005.
Office Action issued by Korean Patent Office for Korean counterpart application with English translation, dated Jul. 28, 2006.

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