Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate
2005-01-11
2005-01-11
Fuller, Rodney (Department: 2851)
Photocopying
Projection printing and copying cameras
Illumination systems or details
C355S053000, C355S071000
Reexamination Certificate
active
06842225
ABSTRACT:
A stitching type exposure apparatus for successively exposing an image of a pattern of a reticle (Ri) on different areas of a surface of a substrate (4) while overlaying parts of the same, wherein a density filter (Fj) having a light attenuating part for reducing the amount of light of overlaid parts of the image of the pattern in a sloping manner is provided in the vicinity of the reticle (Ri), the density filter (Fj) is held at a filter stage (FS) for adjusting the posture, the posture of the density filter (Fj) is detected by an illumination uniformity sensor (126) on the substrate stage (6), and the posture of the density filter (Fj) is matched with the posture of the reticle (Ri) by the filter stage (FS).
REFERENCES:
patent: 4748478 (1988-05-01), Suwa et al.
patent: 4853756 (1989-08-01), Matsuki
patent: 5119390 (1992-06-01), Ohmori
patent: 5477304 (1995-12-01), Nishi
patent: 5486896 (1996-01-01), Hazama et al.
patent: 5593800 (1997-01-01), Fujioka et al.
patent: 5861944 (1999-01-01), Nishi
patent: 6118516 (2000-09-01), Irie et al.
patent: 6213607 (2001-04-01), Watanabe et al.
patent: 6295119 (2001-09-01), Suzuki
patent: 6337162 (2002-01-01), Irie
patent: 6653025 (2003-11-01), Nishi
patent: 6677088 (2004-01-01), Magome et al.
patent: 6710847 (2004-03-01), Irie
patent: 20040032576 (2004-02-01), Kondo
patent: 2 299 408 (1996-10-01), None
patent: A 63-55550 (1988-03-01), None
patent: A 4-311025 (1992-11-01), None
patent: A 6-324473 (1994-11-01), None
patent: A 10-256140 (1998-09-01), None
patent: A 2001-60546 (2001-03-01), None
U.S. patent application Ser. No. 09/636,813, Shirato et al., filed Aug. 10, 2000.
Fuller Rodney
Nikon Corporation
Oliff & Berridg,e PLC
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