Exposure apparatus, microdevice, photomask, method of...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S053000, C355S071000

Reexamination Certificate

active

06842225

ABSTRACT:
A stitching type exposure apparatus for successively exposing an image of a pattern of a reticle (Ri) on different areas of a surface of a substrate (4) while overlaying parts of the same, wherein a density filter (Fj) having a light attenuating part for reducing the amount of light of overlaid parts of the image of the pattern in a sloping manner is provided in the vicinity of the reticle (Ri), the density filter (Fj) is held at a filter stage (FS) for adjusting the posture, the posture of the density filter (Fj) is detected by an illumination uniformity sensor (126) on the substrate stage (6), and the posture of the density filter (Fj) is matched with the posture of the reticle (Ri) by the filter stage (FS).

REFERENCES:
patent: 4748478 (1988-05-01), Suwa et al.
patent: 4853756 (1989-08-01), Matsuki
patent: 5119390 (1992-06-01), Ohmori
patent: 5477304 (1995-12-01), Nishi
patent: 5486896 (1996-01-01), Hazama et al.
patent: 5593800 (1997-01-01), Fujioka et al.
patent: 5861944 (1999-01-01), Nishi
patent: 6118516 (2000-09-01), Irie et al.
patent: 6213607 (2001-04-01), Watanabe et al.
patent: 6295119 (2001-09-01), Suzuki
patent: 6337162 (2002-01-01), Irie
patent: 6653025 (2003-11-01), Nishi
patent: 6677088 (2004-01-01), Magome et al.
patent: 6710847 (2004-03-01), Irie
patent: 20040032576 (2004-02-01), Kondo
patent: 2 299 408 (1996-10-01), None
patent: A 63-55550 (1988-03-01), None
patent: A 4-311025 (1992-11-01), None
patent: A 6-324473 (1994-11-01), None
patent: A 10-256140 (1998-09-01), None
patent: A 2001-60546 (2001-03-01), None
U.S. patent application Ser. No. 09/636,813, Shirato et al., filed Aug. 10, 2000.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exposure apparatus, microdevice, photomask, method of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, microdevice, photomask, method of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus, microdevice, photomask, method of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3424517

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.