Exposure apparatus, method of controlling same, method of...

Details Exposure apparatus, method of controlling same, method of... Exposure apparatus, method of controlling same, method of...

2007-05-29

2007-05-29

Lauchman, Layla G. (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C356S400000

Reexamination Certificate

active

10234378

ABSTRACT:
It is determined whether it is necessary to execute processing for automatically measuring a shot compensation parameter. Processing is reduced by performing automatic measurement of the shot compensation parameter only when such measurement is necessary. This is followed by measuring a wafer compensation parameter automatically. Depending upon whether or not automatic measurement of the shot compensation parameter has been performed, it is determined whether to calculate a relative parameter δ between the shot compensation parameter and wafer compensation parameter or to calculate a shot compensation parameter from a stored relative parameter δ and a wafer compensation parameter. This maintains alignment precision. The units comprising the apparatus are driven to perform exposure in accordance with the shot compensation parameter and wafer compensation parameter obtained.

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