Exposure apparatus, method applied to the apparatus, and...

Details Exposure apparatus, method applied to the apparatus, and... Exposure apparatus, method applied to the apparatus, and...

2006-04-06

2009-02-03

Lee, Diane I (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S077000

Reexamination Certificate

active

07486379

ABSTRACT:
An exposure apparatus for exposing a substrate to light via an original plate. A projection optical system projects a pattern of the original plate onto the substrate, a liquid immersion mechanism generates a liquid immersion state in which a gap between the final surface of the projection optical system and the substrate is filled with liquid, a first photosensor detects light which has passed through the projection optical system, a second photosensor, different from the first photosensor, detects light that has passed through the projection optical system, and a controller calibrates an output from the first photosensor in the liquid immersion state based on a first output from the first photosensor in the liquid immersion state, a second output from the first photosensor in a non-liquid immersion state, and a third output from a reference illuminometer.

REFERENCES:
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patent: 6115107 (2000-09-01), Nishi
patent: 2005/0146693 (2005-07-01), Ohsaki
patent: 2006/0001856 (2006-01-01), Moors et al.
patent: 2006/0082744 (2006-04-01), Hirukawa
patent: 2006/0098179 (2006-05-01), Hirukawa
patent: 63-49893 (1988-03-01), None
patent: 2005-12201 (2005-01-01), None
Korean Office Action dated Aug. 17, 2007, issued in corresponding Korean patent application No. 10-2006-0035669.

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