Exposure apparatus, manufacturing system, and device...

Details Exposure apparatus, manufacturing system, and device... Exposure apparatus, manufacturing system, and device...

2008-02-21

2009-12-01

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

With developing

C355S053000

Reexamination Certificate

active

07626679

ABSTRACT:
An exposure apparatus of the present invention includes: an exposure unit configured to expose photoresist coated on a substrate to light to transfer a pattern of a mask to the photoresist with respect to each of shot regions; and a controller configured to obtain a dose of light for each of the shot regions based on a lithography schedule for each of the shot regions, and to cause the exposure unit to expose each of the shot regions to light in accordance with the obtained dose of light.

REFERENCES:
patent: 6607863 (2003-08-01), Irie
patent: 2007/0128529 (2007-06-01), Kazaana
patent: 10-261572 (1998-09-01), None
patent: 2005-322930 (2005-11-01), None
patent: 2007-019370 (2007-01-01), None
Japanese Office Action issued on Jan. 5, 2009 for the Japanese Patent Application No. 2007-042678 and not previously cited in a different Office Action (No English translation provided).

Affiliated with

Also associated with

Rating

Exposure apparatus, manufacturing system, and device... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, manufacturing system, and device..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus, manufacturing system, and device... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4079748