Exposure apparatus, maintenance method therefor,...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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C355S053000

Reexamination Certificate

active

07034918

ABSTRACT:
An exposure apparatus includes a reticle stage which holds a reticle, a projection optical system which projects a pattern of the reticle onto a substrate, a reticle surface plate which is a base plate disposed between the reticle and the projection optical system and which supports the reticle stage. The reticle surface plate has an opening for transmitting exposure light. The exposure apparatus further includes a sheet glass set on the reticle surface plate so as to separate a space inside the opening of the reticle surface plate from a space above the reticle surface plate.

REFERENCES:
patent: 4676614 (1987-06-01), Ohno
patent: 4766309 (1988-08-01), Kudo
patent: 5243377 (1993-09-01), Umatate et al.
patent: 5305364 (1994-04-01), Mochiji et al.
patent: 5559584 (1996-09-01), Miyaji et al.
patent: 6207962 (2001-03-01), Okino
patent: 6253464 (2001-07-01), Klebanoff et al.
patent: 6341006 (2002-01-01), Murayama et al.
patent: 6362489 (2002-03-01), Okino
patent: 6542220 (2003-04-01), Schrijver et al.
patent: 2001/0052578 (2001-12-01), Okino
patent: 1 030 351 (2000-08-01), None
patent: 1 075 017 (2001-02-01), None
patent: 1 098 225 (2001-05-01), None
patent: 6-260385 (1994-09-01), None
patent: 6-275489 (1994-09-01), None
patent: 7-263296 (1995-10-01), None
patent: 8-279458 (1996-10-01), None
patent: 8-279459 (1996-10-01), None
patent: 9-82625 (1997-03-01), None
patent: 11-219902 (1999-08-01), None
patent: 2000-58447 (2000-02-01), None
patent: 2000-179590 (2000-06-01), None
patent: 2000-195779 (2000-07-01), None
patent: 2001-210587 (2001-08-01), None
patent: WO 99/50892 (1999-10-01), None
Okabe, Hideo. “Photochemistry of Small Molecules,”A Wiley-Interscience Publication, 1978, p. 177-179.
Korean Office Action dated Sep. 17, 2003, issued in corresponding Korean patent application No. 10-2001-0070791.
Partial European Search Report dated Jan. 28, 2005, issued in corresponding European patent application No. EP 01 03 9576, forwarded in a Communication dated Feb. 14, 2005.
Taiwanese Office Action dated Sep. 9, 2005, issued in corresponding Taiwanese patent application No. 090127683.

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