Exposure apparatus including an optical system for aligning a re

Details Exposure apparatus including an optical system for aligning a re Exposure apparatus including an optical system for aligning a re

1986-10-08

1988-09-13

Westin, Edward P.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356400, G01N 2186

Patent

active

047711809

ABSTRACT:
A reduction projection type alignment and exposure apparatus having a light source, for alignment, a reticle having at least a first grating, first lens system, a spatial filter disposed around a Fourier spectral plane of the first lens system, second lens system, a wafer having at least a second grating, and a photo-detector for detecting light intensity of superimposed beams appearing on the spatial filter. An optical system for light exposure is provided separately from the optical system for alignment which includes the light source for alignment, first and second lens system, spatial filter, etc. The light beam generated from the light source for alignment is applied to the reticle at which it is divided into a plurality of difracted light beams by the first grating, and the diffracted light beams are applied through the first lens system, spatial filter and second lens system onto the wafer so that the diffracted light beams are re-diffracted by the second grating, and the re-diffracted light beams are superimposed with the diffracted light beams and the light intensity of the superimposed beams detected by the photo-detector.

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patent: 4636626 (1987-01-01), Hazama et al.
patent: 4668089 (1987-05-01), Oshida et al.

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