Exposure apparatus including a controller configured to read...

Details Exposure apparatus including a controller configured to read... Exposure apparatus including a controller configured to read...

2006-12-26

2006-12-26

Pham, Hai (Department: 2861)

Incremental printing of symbolic information

Light or beam marking apparatus or processes

Scan of light

C347S246000, C438S059000

Reexamination Certificate

active

07154524

ABSTRACT:
An exposure apparatus for exposing a substrate to a light pulse via a mask. The apparatus includes an array of photoelectric converters to detect the light pulse, and a read circuit to read electrical signals from the array. The read circuit reads electrical signals from a part of the photoelectric converters sequentially switched with respect to each time interval between a successive two of the light pulses thereby to obtain cumulative electrical signals corresponding to a plurality of the light pulses.

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patent: 5650643 (1997-07-01), Konuma
patent: 6424405 (2002-07-01), Kurosawa et al.
patent: 7027079 (2006-04-01), Akamatsu
patent: 2002/0193901 (2002-12-01), Kikuchi
patent: 1-274020 (1989-11-01), None
patent: 2-5063 (1990-01-01), None

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