Exposure apparatus implementing priority speed setting arrangeme

Details Exposure apparatus implementing priority speed setting arrangeme Exposure apparatus implementing priority speed setting arrangeme

1996-08-28

1998-11-17

Kim, Robert

Optics: measuring and testing

By polarized light examination

With birefringent element

356401, 355 53, 355 55, G01B 1100

Patent

active

058384430

ABSTRACT:
An exposure apparatus includes an exposure system for printing a pattern of a mask on a photosensitive substrate while moving a stage, supporting the photosensitive substrate, sequentially to exposure positions in accordance with a speed pattern having a predetermined highest speed and a predetermined maximum acceleration, and a device for changeably setting the highest speed.

REFERENCES:
patent: 5008703 (1991-04-01), Kawakami et al.

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