Exposure apparatus having the same ID bias

Details Exposure apparatus having the same ID bias Exposure apparatus having the same ID bias

2011-04-26

2011-04-26

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S067000

Reexamination Certificate

active

07932998

ABSTRACT:
An exposure apparatus includes an exposure light source generating light to be emitted to photomask, a projection lens for projecting the light having passed through the photomask to wafer, and a transmittance adjustment filter in projection lens the transmittance adjustment filter varies the transmittance of the light projected into the projection lens as a function of position in the projection lens.

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patent: 10-2001-0090252 (2001-10-01), None
patent: 10-2003-0089763 (2003-11-01), None
patent: 10-2006-0024073 (2006-03-01), None

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