Exposure apparatus having catadioptric projection optical system

Optical: systems and elements – Lens – With reflecting element

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

359727, G02B 1700

Patent

active

059993332

ABSTRACT:
To use a beam splitting optical system smaller than the conventional beam splitters and to set a longer optical path between a concave, reflective mirror and an image plane. A light beam from an object surface travels through a first converging group to enter a beam splitter, and a light beam reflected by the beam splitter is reflected by a concave, reflective mirror to form an image of patterns on the object surface inside the concave, reflective mirror. A light beam from the image of the patterns passes through the beam splitter and thereafter forms an image of the patterns through a third converging group on an image plane.

REFERENCES:
patent: 4497015 (1985-01-01), Konno et al.
patent: 4666273 (1987-05-01), Shimizu
patent: 4685777 (1987-08-01), Hirose
patent: 4701035 (1987-10-01), Hirose
patent: 4779966 (1988-10-01), Friedman
patent: 4812028 (1989-03-01), Matsumoto
patent: 4953960 (1990-09-01), Williamson
patent: 5052763 (1991-10-01), Singh et al.
patent: 5089913 (1992-02-01), Singh et al.
patent: 5194893 (1993-03-01), Nishi
patent: 5212593 (1993-05-01), Williamson et al.
patent: 5220454 (1993-06-01), Ichihara et al.
patent: 5241423 (1993-08-01), Chiu et al.
patent: 5253110 (1993-10-01), Ichihara et al.
patent: 5323263 (1994-06-01), Schoenmakers
patent: 5365051 (1994-11-01), Suzuki et al.
patent: 5402267 (1995-03-01), Furter et al.
patent: 5406415 (1995-04-01), Kelly
patent: 5506684 (1996-04-01), Ota et al.
patent: 5515207 (1996-05-01), Foo
patent: 5534970 (1996-07-01), Nakashima et al.
patent: 5537260 (1996-07-01), Williamson
patent: 5583696 (1996-12-01), Takahashi
patent: 5591958 (1997-01-01), Nishi et al.
patent: 5592329 (1997-01-01), Ishiyama et al.
patent: 5636066 (1997-06-01), Takahashi
patent: 5668673 (1997-09-01), Suenaga et al.
patent: 5706137 (1998-01-01), Kelly
patent: 5742436 (1998-04-01), Furter
patent: 5808805 (1998-09-01), Takahashi

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exposure apparatus having catadioptric projection optical system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus having catadioptric projection optical system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus having catadioptric projection optical system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-830775

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.