Exposure apparatus, gas replacing method, and method of...

Details Exposure apparatus, gas replacing method, and method of... Exposure apparatus, gas replacing method, and method of...

2005-03-29

2005-03-29

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S067000, C355S077000

Reexamination Certificate

active

06873397

ABSTRACT:
An exposure apparatus includes a chamber surrounding a predetermined space, a first gas supply unit for supplying a first gas into the chamber, a second gas supply unit for supplying a second gas, different from the first gas into the chamber, and a switching mechanism for supplying one of the first and second gases by switching between the first and second gas supply units.

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Korean Office Action dated Aug. 1, 2003, issued In a corresponding Korean pat nt application.

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