Exposure apparatus for transferring a mask pattern onto a substr

Details Exposure apparatus for transferring a mask pattern onto a substr Exposure apparatus for transferring a mask pattern onto a substr

1996-08-20

1998-04-07

Moses, R. L.

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

355 53, G03B 2760

Patent

active

057370648

ABSTRACT:
An exposure method for irradiating a mask from above the mask held in proximity to a substrate positioned below the mask to transfer a mask pattern of the mask to a photosensitive layer of the substrate by exposing the photosensitive layer to a light beam, includes the steps of using a gap-measuring device to measure a gap between a portion of the mask to be locally scanned and irradiated and a portion of the substrate to be locally irradiated, comparing a value measured by the gap-measuring device with a preset value, and locally deforming the mask and/or the substrate according to a difference between the value measured by the gap-measuring device and the preset value so as to cause the gap to approach a predetermined value.

REFERENCES:
patent: 4475223 (1984-10-01), Taniguchi et al.
patent: 4618261 (1986-10-01), Flanders
patent: 4669868 (1987-06-01), Chapelle et al.
patent: 4708465 (1987-11-01), Isohata et al.
patent: 4998134 (1991-03-01), Ishohata et al.
patent: 5298939 (1994-03-01), Swanson et al.
patent: 5377009 (1994-12-01), Kitaoka et al.
patent: 5443932 (1995-08-01), Ohta et al.
patent: 5573877 (1996-11-01), Inoue et al.

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