Exposure apparatus for production of integrated circuit

Details Exposure apparatus for production of integrated circuit Exposure apparatus for production of integrated circuit

1981-12-30

1984-08-14

McGraw, Vincent P.

Optics: measuring and testing

Photometers

Photoelectric

355 53, 355 58, 355 72, G01J 142

Patent

active

044653689

ABSTRACT:
An exposure apparatus for production of ICs of the type that includes a stage on which is placed a semiconductor wafer to be exposed by illumination light projecting means, and means for two-dimensionally moving the stage within a plane intersecting the illumination light at substantially right angles. The improvement comprises illumination detection means provided with a photo reception surface, and means for mounting the illumination detection means on the stage in such a manner that the photo reception surface and the surface of the semiconductor wafer on the stage to be exposed are at substantially equal height relative to the stage.

REFERENCES:
patent: 4205918 (1980-06-01), Kisanuki et al.
patent: 4345836 (1982-08-01), Phillips

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