Exposure apparatus for aligning photosensitive substrate with im

Details Exposure apparatus for aligning photosensitive substrate with im Exposure apparatus for aligning photosensitive substrate with im

1999-06-02

2000-10-24

Adams, Russell

Photocopying

Projection printing and copying cameras

Focus or magnification control

356400, G03B 2752, G01B 1100

Patent

active

061375616

ABSTRACT:
An exposure apparatus comprises a substrate holding portion for holding a photosensitive substrate including a surface, a substrate stage for two-dimensional positioning of the photosensitive substrate via the substrate holding portion, the substrate stage including an upper surface, and an exposure system for transferring a pattern on a mask to the photosensitive substrate by an exposing illumination light. The substrate holding portion is provided in the substrate stage so that the portion of the upper surface of the substrate stage surrounding the photosensitive substrate is substantially flush with the surface of the photosensitive substrate.

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