Exposure apparatus, exposure method, device manufacturing...

Details Exposure apparatus, exposure method, device manufacturing... Exposure apparatus, exposure method, device manufacturing...

2006-12-20

2009-11-24

Kim, Peter B (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000

Reexamination Certificate

active

07623219

ABSTRACT:
An exposure method for exposing a pattern of a reticle which has a patterned area that has the pattern, and a light shielding area provided around the patterned area, said exposure method includes the step of illuminating the reticle via an illumination optical system that includes a field stop, wherein a position corresponding to an edge of an aperture in the field stop is closer to the patterned area than a center of a width of the light shielding area on the reticle, the aperture defining a region for illuminating the reticle.

REFERENCES:
patent: 2003/0081191 (2003-05-01), Nishi et al.
patent: 2005/0042525 (2005-02-01), Takenaka et al.
patent: 2000-252193 (2000-09-01), None
patent: 2005-031287 (2005-02-01), None

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