Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
2007-09-11
2007-09-11
Nguyen, Henry Hung (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S030000
Reexamination Certificate
active
11211749
ABSTRACT:
An exposure apparatus EX exposes a substrate P by projecting an image of a predetermined pattern through a liquid1onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism10which supplies the liquid onto the substrate to form a liquid immersion area AR2on a part of the substrate. The liquid supply mechanism supplies the liquid1onto the substrate P simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area AR1. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding, for example, the outflow of the liquid to the surroundings.
REFERENCES:
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 6788477 (2004-09-01), Lin
patent: 6867844 (2005-03-01), Vogel et al.
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2003/0030916 (2003-02-01), Suenaga
patent: 2003/0174408 (2003-09-01), Rostalski et al.
patent: 2004/0000627 (2004-01-01), Schuster
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0109237 (2004-06-01), Epple et al.
patent: 2004/0114117 (2004-06-01), Bleeker
patent: 2004/0118184 (2004-06-01), Violette
patent: 2004/0119954 (2004-06-01), Kawashima et al.
patent: 2004/0125351 (2004-07-01), Krautschik
patent: 2004/0136494 (2004-07-01), Lof et al.
patent: 2004/0160582 (2004-08-01), Lof et al.
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2004/0169834 (2004-09-01), Richter et al.
patent: 2004/0169924 (2004-09-01), Flagello et al.
patent: 2004/0180294 (2004-09-01), Baba-Ali et al.
patent: 2004/0180299 (2004-09-01), Rolland et al.
patent: 2004/0207824 (2004-10-01), Lof et al.
patent: 2004/0211920 (2004-10-01), Maria Derksen et al.
patent: 2004/0224265 (2004-11-01), Endo et al.
patent: 2004/0224525 (2004-11-01), Endo et al.
patent: 2004/0227923 (2004-11-01), Flagello et al.
patent: 2004/0253547 (2004-12-01), Endo et al.
patent: 2004/0253548 (2004-12-01), Endo et al.
patent: 2004/0257544 (2004-12-01), Vogel et al.
patent: 2004/0259008 (2004-12-01), Endo et al.
patent: 2004/0259040 (2004-12-01), Endo et al.
patent: 2004/0263808 (2004-12-01), Sewell
patent: 2005/0030506 (2005-02-01), Schuster
patent: 2005/0036121 (2005-02-01), Hoogendam et al.
patent: 2005/0036183 (2005-02-01), Yeo et al.
patent: 2005/0036184 (2005-02-01), Yeo et al.
patent: 2005/0036213 (2005-02-01), Mann et al.
patent: 2005/0037269 (2005-02-01), Levinson
patent: 2005/0042554 (2005-02-01), Dierichs et al.
patent: 2005/0046934 (2005-03-01), Ho et al.
patent: 2005/0048223 (2005-03-01), Pawloski et al.
patent: 2005/0068639 (2005-03-01), Pierrat et al.
patent: 2005/0073670 (2005-04-01), Carroll
patent: 2005/0084794 (2005-04-01), Meagley et al.
patent: 2005/0094116 (2005-05-01), Flagello et al.
patent: 2005/0100745 (2005-05-01), Lin et al.
patent: 2005/0110973 (2005-05-01), Streefkerk et al.
patent: 2005/0117224 (2005-06-01), Shafer et al.
patent: 2005/0122497 (2005-06-01), Lyons et al.
patent: 2005/0132914 (2005-06-01), Mulkens et al.
patent: 2005/0134815 (2005-06-01), Van Santen et al.
patent: 2005/0141098 (2005-06-01), Schuster
patent: 2005/0145803 (2005-07-01), Hakey et al.
patent: 2005/0146694 (2005-07-01), Tokita
patent: 2005/0146695 (2005-07-01), Kawakami
patent: 2005/0147920 (2005-07-01), Lin et al.
patent: 2005/0153424 (2005-07-01), Coon
patent: 2005/0158673 (2005-07-01), Hakey et al.
patent: 2005/0164502 (2005-07-01), Deng et al.
patent: 2005/0174549 (2005-08-01), Duineveld et al.
patent: 2005/0175940 (2005-08-01), Dierichs
patent: 2005/0185269 (2005-08-01), Epple et al.
patent: 2005/0190435 (2005-09-01), Shafer et al.
patent: 2005/0190455 (2005-09-01), Rostalski et al.
patent: 2005/0217135 (2005-10-01), O'Donnell et al.
patent: 2005/0217137 (2005-10-01), Smith et al.
patent: 2005/0217703 (2005-10-01), O'Donnell
patent: 2005/0225737 (2005-10-01), Weissenrieder et al.
patent: 2005/0270505 (2005-12-01), Smith
patent: 221 563 (1985-04-01), None
patent: 224 448 (1985-07-01), None
patent: 0 060 729 (1982-09-01), None
patent: A-57-153433 (1982-09-01), None
patent: A 57-153433 (1982-09-01), None
patent: A-58-202448 (1983-11-01), None
patent: A-59-19912 (1984-02-01), None
patent: A 62-65326 (1987-03-01), None
patent: A-62-65326 (1987-03-01), None
patent: A-63-157419 (1988-06-01), None
patent: A-4-305915 (1992-10-01), None
patent: A-04-305915 (1992-10-01), None
patent: A-4-305917 (1992-10-01), None
patent: A-04-305917 (1992-10-01), None
patent: A-5-62877 (1993-03-01), None
patent: A-05-62877 (1993-03-01), None
patent: A-6-124873 (1994-05-01), None
patent: A 6-124873 (1994-05-01), None
patent: A-07-220990 (1995-08-01), None
patent: A 07-220990 (1995-08-01), None
patent: A-8-316125 (1996-11-01), None
patent: A 10-255319 (1998-09-01), None
patent: A-10-303114 (1998-11-01), None
patent: A 10-303114 (1998-11-01), None
patent: A 10-340846 (1998-12-01), None
patent: A-10-340846 (1998-12-01), None
patent: A 11-176727 (1999-07-01), None
patent: A-11-176727 (1999-07-01), None
patent: A-2000-58436 (2000-02-01), None
patent: A 2000-58436 (2000-02-01), None
patent: WO99/49504 (1999-09-01), None
patent: WO99/49504 (1999-09-01), None
patent: WO 01/27978 (2001-04-01), None
patent: WO 02/091078 (2002-11-01), None
patent: WO 03/077037 (2003-09-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/055803 (2004-07-01), None
patent: WO 2004/057589 (2004-07-01), None
patent: WO 2004/057590 (2004-07-01), None
patent: WO 2004/077154 (2004-09-01), None
patent: WO 2004/081666 (2004-09-01), None
patent: WO 2004/090577 (2004-10-01), None
patent: WO 2004/090633 (2004-10-01), None
patent: WO 2004/090634 (2004-10-01), None
patent: WO 2004/092830 (2004-10-01), None
patent: WO 2004/092833 (2004-10-01), None
patent: WO 2004/093130 (2004-10-01), None
patent: WO 2004/093159 (2004-10-01), None
patent: WO 2004/093160 (2004-10-01), None
patent: WO 2004/095135 (2004-11-01), None
patent: WO 2005/001432 (2005-01-01), None
patent: WO 2005/003864 (2005-01-01), None
patent: WO 2005/006026 (2005-01-01), None
patent: WO 2005/008339 (2005-01-01), None
patent: WO 2005/013008 (2005-02-01), None
patent: WO 2005/015283 (2005-02-01), None
patent: WO 2005/017625 (2005-02-01), None
patent: WO 2005/019935 (2005-03-01), None
patent: WO 2005/022266 (2005-03-01), None
patent: WO 2005/024325 (2005-03-01), None
patent: WO 2005/024517 (2005-03-01), None
patent: WO 2005/034174 (2005-04-01), None
patent: WO 2005/054953 (2005-06-01), None
patent: WO 2005/054955 (2005-06-01), None
patent: WO 2005/059617 (2005-06-01), None
patent: WO 2005/059618 (2005-06-01), None
patent: WO 2005/059645 (2005-06-01), None
patent: WO 2005/059654 (2005-06-01), None
patent: WO 2005/062128 (2005-07-01), None
patent: WO 2005/064400 (2005-07-01), None
patent: WO 2005/064405 (2005-07-01), None
patent: WO 2005/069055 (2005-07-01), None
patent: WO 2005/069078 (2005-07-01), None
patent: WO 2005/069081 (2005-07-01), None
patent: WO 2005/071491 (2005-08-01), None
patent: WO 2005/074606 (2005-08-01), None
patent: WO 2005/076084 (2005-08-01), None
patent: WO 2005/081030 (2005-09-01), None
patent: WO 2005/081067 (2005-09-01), None
Emerging Lithographic Technologies VI, Proceedings of SPIE, vol. 4688 (2002), “Semiconductor Foundry, Lithography, and Partners”, B.J. Lin, pp. 11-24.
Optical Microlithography XV, Proceedings of SPIE, vol. 4691 (2002), “Resolution Enhancement of 157 nm Lithography by Liquid Immersion”, M. Switkes et al., pp. 459-465.
J. Microlith., Microfab., Microsyst., vol. 1 No. 3, Oct. 2002, Society of Photo-Optical Instrumentation Engineers, “Resolution enhancement of 157 nm lithography by liquid immersion”, M. Switkes et al., pp. 1-4.
Nikon Corporation, 3rd157 nm symposium, Sep. 4, 2002, “Nikon F2 Exposure Tool”, Soichi Owa
Nguyen Henry Hung
Nikon Corporation
Oliff & Berridg,e PLC
LandOfFree
Exposure apparatus, exposure method, and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Exposure apparatus, exposure method, and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus, exposure method, and method for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3783994