Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate
2005-10-12
2010-12-14
Nguyen, Hung Henry (Department: 2882)
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
C355S053000
Reexamination Certificate
active
07852456
ABSTRACT:
An exposure apparatus fills an optical path space of an exposure light beam with a liquid, and exposes a substrate by irradiating the substrate with the exposure light beam via a projection optical system and the liquid. A first optical element of the projection optical system is provided with a removing device for removing foreign matters in a space inside of the concave surface portion. Immersion exposure is performed by permitting the exposure light beam to excellently reach an image plane via the projection optical system and the liquid.
REFERENCES:
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 4666273 (1987-05-01), Shimizu et al.
patent: RE32795 (1988-12-01), Matsuura et al.
patent: 5493403 (1996-02-01), Nishi
patent: 5610683 (1997-03-01), Takahashi
patent: 5646413 (1997-07-01), Nishi
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 5969441 (1999-10-01), Loopstra et al.
patent: 6195154 (2001-02-01), Imai
patent: 6208407 (2001-03-01), Loopstra
patent: 6235438 (2001-05-01), Suzuki et al.
patent: 6341007 (2002-01-01), Nishi et al.
patent: 7088422 (2006-08-01), Hakey et al.
patent: 2001/0035945 (2001-11-01), Ozawa
patent: 2002/0041377 (2002-04-01), Hagiwara et al.
patent: 2002/0061469 (2002-05-01), Tanaka
patent: 2004/0125351 (2004-07-01), Krautschik
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2004/0263809 (2004-12-01), Nakano
patent: 2005/0074704 (2005-04-01), Endo et al.
patent: 2005/0219489 (2005-10-01), Nei et al.
patent: 2006/0197927 (2006-09-01), Mulkens et al.
patent: 2007/0009841 (2007-01-01), Endo et al.
patent: 1606128 (2005-04-01), None
patent: 221 563 (1985-04-01), None
patent: 224 448 (1985-07-01), None
patent: 0 605 103 (1994-07-01), None
patent: 1 420 298 (2004-05-01), None
patent: 1 571 697 (2005-09-01), None
patent: A-57-117238 (1982-07-01), None
patent: A 58-202448 (1983-11-01), None
patent: A 59-19912 (1984-02-01), None
patent: A-60-078454 (1985-05-01), None
patent: A 62-65326 (1987-03-01), None
patent: A 63-157419 (1988-06-01), None
patent: A-04-065603 (1992-03-01), None
patent: A 4-305915 (1992-10-01), None
patent: A 4-305917 (1992-10-01), None
patent: A 5-62877 (1993-03-01), None
patent: A 6-124873 (1994-05-01), None
patent: A-07-176468 (1995-07-01), None
patent: A 7-220990 (1995-08-01), None
patent: A-08-037149 (1996-02-01), None
patent: A 8-316125 (1996-11-01), None
patent: A 10-303114 (1998-11-01), None
patent: A 10-340846 (1998-12-01), None
patent: A-11-016816 (1999-01-01), None
patent: A-11-135400 (1999-05-01), None
patent: A 11-176727 (1999-07-01), None
patent: A-11-195602 (1999-07-01), None
patent: A-11-260686 (1999-09-01), None
patent: A 2000-58436 (2000-02-01), None
patent: A-2001-267239 (2001-09-01), None
patent: A-2002-014005 (2002-01-01), None
patent: A 2004-207710 (2004-07-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/029559 (2004-04-01), None
patent: WO 2004/053955 (2004-06-01), None
patent: WO 2004/055803 (2004-07-01), None
patent: WO 2004/057590 (2004-07-01), None
Nov. 26, 2009 European Search Report in Application No. 05793205.5.
Simon G. Kaplan et al., “Characterization of Refractive Properties of Fluids for Immersion Photolithography,” Physics Laboratory National Institute of Standards and Technology, International Symposium on Immersion and 157 nm Lithography, Gaithersburg, Maryland, Aug. 3, 2004.
Office Action issued in European Patent Application No. 05793205.5 on Mar. 17, 2010.
Office Action issued in U.S. Appl. No. 11/665,073; mailed Apr. 2, 2010.
Office Action issued in Chinese Patent Application No. 200910008214.2; mailed Mar. 1, 2010; with partial English-language translation.
Nguyen Hung Henry
Nikon Corporation
Oliff & Berridg,e PLC
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