Exposure apparatus, exposure method and device manufacturing...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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Details

C355S075000

Reexamination Certificate

active

07663732

ABSTRACT:
An exposure apparatus, and exposure method and a device manufacturing method, wherein the exposure apparatus includes a projection optical system, an original stage configured to hold an original thereon and to move the original, a position measuring system configured to measure a position of a pattern surface of the original held by the original stage, with respect to a direction parallel to an optical axis of the projection optical system, an exposure system configured to expose a substrate through the original and the projection optical system, on the basis of the measurement by the position measuring system, a memory configured to store therein compensation information that interrelates a temperature of the position measuring system and a compensation quantity for compensating for an output of the position measuring system, and a controller configured to compensate for an output of the position measuring system on the basis of the compensation information stored in the memory, to obtain a position measured value for the pattern surface.

REFERENCES:
patent: 5940528 (1999-08-01), Tanaka et al.
patent: 6645701 (2003-11-01), Ota et al.
patent: 2003-264136 (2003-09-01), None

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