Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2008-05-15
2009-08-11
Wells, Nikita (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492200, C250S492100, C250S372000, C430S313000, C430S323000, C438S531000, C438S669000, C438S975000
Reexamination Certificate
active
07573052
ABSTRACT:
A pattern image generation device generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is photoelectrically detected by a detection system. Then, a correction device corrects design data that should be input to the pattern image generation device based on the detection results. Accordingly, a pattern image is generated on an object by the pattern image generation device corresponding to the input of the design data after the correction, and because the object is exposed using the pattern image, a desired pattern is formed on the object with good precision.
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Inoue Hideya
Kiuchi Tohru
Miles & Stockbridge P.C.
Nikon Corporation
Wells Nikita
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